Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
Applications | 2020 | Agilent TechnologiesInstrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
IndustriesSemiconductor Analysis
ManufacturerAgilent Technologies
Key wordsgermane, arsine, phosphine, silane, icp, sulfide, hydrogen, gas, integration, hydride, dopants, time, qqq, gallium, standard, dls, cell, area, kinetic, interferences, semiconductor, analyte, epilayers, used, discrimination, argon, best, arsenide, mass, limits, tune, using, entrainment, iii, compounds, appeal, multiplication, acquisition, modes, removal, single, dopant, contaminants, purity, dilution, impurities, measure, noise, mode, deliberately
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