New Fast Approach for Achieving USP <467> compliance
Applications | | DANI InstrumentsInstrumentation
Residual solvents must be controlled to ensure safety and regulatory compliance in pharmaceutical products. USP <467> defines thresholds and analytical requirements for monitoring residual solvents to mitigate toxic risks and guarantee product quality.
The study aimed to develop and validate a faster analytical approach for quantifying USP <467> residual solvents. By integrating the DANI Master Static Headspace Sampler (SHS) with a fast GC-FID system, it sought to shorten cycle times, boost lab throughput, and maintain stringent performance criteria.
Advancements in digital instrument control and headspace automation can enable real-time solvent monitoring and remote operation. Integration with advanced data analytics and LIMS platforms will further streamline compliance workflows and decision-making processes.
The combination of DANI Master SHS and fast GC-FID technology delivers a robust and high-throughput solution for USP <467> residual solvent analysis. Enhanced pressure control strategies achieve exceptional repeatability and sensitivity, supporting stringent quality requirements in pharmaceutical applications.
GC, HeadSpace
IndustriesPharma & Biopharma
ManufacturerDANI Instruments
Summary
Significance of the Topic
Residual solvents must be controlled to ensure safety and regulatory compliance in pharmaceutical products. USP <467> defines thresholds and analytical requirements for monitoring residual solvents to mitigate toxic risks and guarantee product quality.
Objectives and Overview
The study aimed to develop and validate a faster analytical approach for quantifying USP <467> residual solvents. By integrating the DANI Master Static Headspace Sampler (SHS) with a fast GC-FID system, it sought to shorten cycle times, boost lab throughput, and maintain stringent performance criteria.
Methodology
- The static headspace technique (“Valve & Loop”) was employed to partition volatiles from aqueous standards.
- Two loop pressurization modes (“pressure” and “custom”) were evaluated at various target pressures (0.25 bar, 0.5 bar) and depressurization rates.
- Oven temperature programs optimized to achieve separation for Class 1, 2A, and 2B solvents within minimal run times.
Instrumentation Used
- DANI Master SHS Static Headspace Sampler with Variable Headspace module; precise vial pressurization and temperature control.
- DANI Master GC Fast Gas Chromatograph equipped with split/splitless injector and FID detector.
- HP Innowax and DB-624 capillary columns; helium carrier gas; nitrogen for vial pressurization.
Key Results and Discussion
- Loop “pressure” mode at 0.5 bar delivered optimal repeatability (RSD < 1%) and higher response areas across Class 1, 2A, and 2B solvent mixtures.
- The “custom” depressurization mode further enhanced sensitivity by controlling pressure ramp rates up to 200 mbar/s.
- Total analysis times were reduced, enabling increased sample throughput without compromising analytical figures of merit.
Benefits and Practical Applications
- Ensures consistent compliance with USP <467> and risk-based solvent control in drug substances and products.
- Significantly increased laboratory productivity due to accelerated cycle times and large vial capacity.
- Improved data integrity features facilitate alignment with 21 CFR Part 11 requirements in regulated environments.
Future Trends and Opportunities
Advancements in digital instrument control and headspace automation can enable real-time solvent monitoring and remote operation. Integration with advanced data analytics and LIMS platforms will further streamline compliance workflows and decision-making processes.
Conclusion
The combination of DANI Master SHS and fast GC-FID technology delivers a robust and high-throughput solution for USP <467> residual solvent analysis. Enhanced pressure control strategies achieve exceptional repeatability and sensitivity, supporting stringent quality requirements in pharmaceutical applications.
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