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Instruments for Analyzing / Evaluating Electronic Device

Brochures and specifications | 2022 | ShimadzuInstrumentation
GC/MSD, HeadSpace, Thermal desorption, Pyrolysis, GC/SQ, Ion chromatography, NIR Spectroscopy, UV–VIS spectrophotometry, ICP/MS, ICP-OES, AAS, FTIR Spectroscopy, Microscopy, X-ray, TOC
Industries
Materials Testing, Semiconductor Analysis
Manufacturer
Shimadzu

Summary

Importance of the Topic


Quality control and evaluation of electronic components play a critical role across the electronics and semiconductor industries. Advanced analytical methods are essential for ensuring device reliability, monitoring trace contaminants, verifying material integrity and meeting increasingly stringent environmental regulations such as RoHS and ELV.

Objectives and Overview


This document presents a comprehensive overview of analytical approaches and instrumentation tailored for the evaluation of electrical and electronic devices. It illustrates key applications in microstructure observation, elemental and surface chemistry analysis, optical and thermal measurement, hazardous substance screening, mechanical testing, particle characterization and environmental monitoring.

Methodology


Analytical strategies covered include:
  • Non-destructive imaging by X-ray fluoroscopy and computed tomography
  • High-resolution microscopy via electron probe microanalysis, X-ray photoelectron spectroscopy and atomic force microscopy
  • Spectroscopic techniques including FTIR, UV-VIS-NIR, energy dispersive X-ray fluorescence and GC-MS
  • Trace element quantification using ICP optical emission and mass spectrometry
  • Thermal analysis by differential scanning calorimetry and thermogravimetry
  • Mechanical and endurance testing with universal testers, microforce and hardness instruments
  • Particle size and shape analysis by dynamic image analysis
  • Water and gas monitoring with TOC analyzers, headspace and thermal desorption GC-MS

Instrumentation


The principal instruments include:
  • EPMA-1720, EPMA-8050G for submicron contaminant mapping
  • KRATOS ULTRA2 and NOVA XPS systems for surface chemistry imaging
  • SPM-9700HT, SPM-Nanoa and HR-SPM-8100FM AFM/SPM for nanoscale topography
  • inspeXio SMX series and Xslicer CT/fluoroscopy for internal structure analysis
  • IRTracer-100 and IRAffinity-1S infrared microscopes for organic contaminants and film thickness
  • SolidSpec-3700i and UV-1900i spectrophotometers for coating reflectance and transmittance
  • EDX-7200/8100 and EDX-LE Plus for elemental screening under RoHS/ELV
  • Py-Screener GC-MS and TD-30/HS-20 NX for volatile and semi-volatile organic analysis
  • HIC-ESP ion chromatography for halogen and sulfur determination
  • ICPE-9800 and ICPMS-2030 for accurate trace metal analysis
  • DSC-60 and DTG-60 for thermal property characterization
  • iSpect DIA-10 for particle distribution and morphology
  • TOC-L and TOC-1000e analyzers for ultrapure water quality control
  • AGX-V, AGS-X and EZ-X universal testers plus MMT and MCT microforce machines
  • DUH-211 microhardness testers and CFT-500EX capillary rheometers
  • AP series analytical balances for microgram mass measurements

Main Results and Discussion


High-resolution EPMA revealed submicron contaminant migration in solder joints. XPS imaging identified surface bond states beneath ultrathin films. AFM/SPM systems provided atomic-scale topography and mechanical property maps in air and liquid. Non-destructive CT enabled void detection and dimensional verification of plastic connectors and BGA joints. Infrared microscopy and FTIR quantified organic residues and film thickness. UV-VIS-NIR instruments measured antireflection coatings, while GC-MS and ion chromatography screened for VOCs, phthalates, halogens and sulfur. ICP-based techniques delivered precise quantification of heavy metals. Thermal analyzers characterized phase transitions in liquid crystal and epoxy materials. Mechanical testers quantified adhesion, shearing, compression and fatigue performance of components.

Benefits and Practical Applications


Integrating these analytical approaches improves failure analysis, accelerates process optimization and ensures compliance with environmental and industry standards. Non-destructive 3D inspection reduces sample damage, while nanoscale imaging and surface chemistry analysis support advanced material development. Comprehensive monitoring of hazardous substances and mechanical properties enhances product reliability and safety.

Future Trends and Potential Applications


Emerging directions include automation and machine learning for data interpretation, higher throughput nanoscale characterization, real-time in situ monitoring under operational conditions, and correlative multimodal imaging. These advances will support next-generation flexible electronics, energy storage materials, and miniaturized devices with increasingly complex architectures.

Conclusion


The suite of analytical instruments and methodologies outlined here provides a robust framework for the quality control and evaluation of electronic components. By covering structural imaging, elemental and chemical state analysis, optical and thermal measurement, mechanical testing and environmental monitoring, manufacturers and researchers can ensure device performance, regulatory compliance and accelerated development cycles.

References


None specified in source document.

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