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Applications from Teledyne LABS - page 2

US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Agilent 7890B GC and 5977A MSD System

Applications
| 2017 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

US EPA Method 8260 with the Tekmar Atomx XYZ P&T System and Agilent 7890B GC/5977A MS

Applications
| 2017 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

Analysis of Epichlorohydrin in Drinking Water Using the Lumin P & T Concentrator

Applications
| 2017 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

US EPA Method 624 with the Tekmar Lumin P&T Concentrator and the Thermo Scientific™ TRACE™ 1310 GC and ISQ™ LT MS

Applications
| 2017 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

US EPA Method 8260 with the Tekmar Lumin P&T Concentrator and Thermo Scientific™ TRACE™ 1310 GC and ISQ™ MS

Applications
| 2017 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

Exploring US EPA Method 524 Purge and Trap Variables: Water Vapor Reduction and Minimizing Cycle Time

Applications
| 2016 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

Meeting the Korean Method ES 04603.2b for 12 VOC (휘발성유기화합물) with Static and Dynamic Headspace GC/MS

Applications
| 2016 | Teledyne LABS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

Meeting the Korean Method ES 04605.3 for Formaldehyde (폼알데하이드) with Static Headspace GC/MS

Applications
| 2016 | Teledyne LABS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

Meeting the Korean Method ES 04607.1 for Naphthalene (나프탈렌) with Static and Dynamic Headspace GC/MS

Applications
| 2016 | Teledyne LABS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental

US EPA Method 8260 with the Tekmar Lumin and the Agilent 7890B GC / 5977A MS

Applications
| 2016 | Teledyne LABS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
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